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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
277
Mots-clés
Calcined clay
CHLORINE PLASMAS
A Thin films
Capacitance
B2 Quaternary
Alloying
Functionalization
Physical vapor deposition
Selenization
B2 Semiconducting alloys
Aryl-diazonium salts
SF 6
C Photoelectron spectroscopy
Non-volatile memory
Residual stress
Carbon nitride
AZO thin films
Thin film
A1 Characterization
Applications industrielles
CIGSe
Kirkendall effect
Biomasse
Carbon
Scanning electron microscopy
Chalcogenide
Films
3 nm in size
Mott insulator
B1 Inorganic compounds
Chalcogenides
Avalanche breakdown
Low-pressure plasma processing
Optical properties
Semiconductors
Resistive switching
Nanocomposite
Etching
AlN
Alzheimer's disease
Ablation laser
A Multilayers
Band alignment
B3 Solar cells
Titanium dioxide
A Chalcogenides
TiO2
Amorphous
Bixbyite
Plasmas froids
B2 Semiconducting indium compounds
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Aluminium nitride
A3 Physical vapor deposition processes
Colloidal solution
Bipolar resistive switching BRS
Structure
PECVD
X-ray diffraction
Chemical detection
Plasma etching
Carbon Nanotube
Buffer Couple
Biofilms microbiens
Sputtering
Transmission electron microscopy
X-ray photoelectron spectroscopy
Atomic force microscopy
Adsorption
Spectroscopic ellipsometry
Band gap
Thin films
NEXAFS
CH4
Chemical and biological sensors
Copper
V2O3
Amyloid precursor
B Chemical synthesis
TEM
Anatase
Transfert d'énergie
CNTs’ collapse
Mott insulators
Oxides
Carbon nanotubes
XPS
AuCu alloy
Vanadium Sesquioxide
Cathepsin
Biocapteurs
A-CNx
Ambipolar material
Atomic layer etching
BOMBARDMENT
Chalcogenide glass
Sol-gel
Nanotubes
CaTiO3Pr^3^+
Magnetron sputtering